Thin Film Formation by Aerosol Deposition Technique under Microgravity Condition during Parabolic Flight

Int. J. Microgravity Sci. Appl. 2014p038
Author
M. WATANABE, S. NAKANAO, A. MIZUNO and J. AKEDO
Organization
Faculty of Science, Gakushuin University,National Institute of Advanced Industrial Science and Technology (AIST)
Abstract
We clarify the aerosol dynamics during thin film formation by using the aerosol deposition (AD) technique under the microgravity conditions. Akedo et al. (1999) showed that AD technique is useful for making thin film of ceramics materials. Using AD technique, we have been trying to make thin film of thermally unstable materials, such as clathrate compounds and/or amorphous materials. However, it is difficult to make homogeneously the aerosol of these materials, because in the terrestrial conditions the fine particles of these materials are settled down below the chamber during making its aerosol. Thus, in the microgravity conditions, we hope to make homogeneously aerosol for good quality of thin film by AD technique. In order to make homogeneous aerosol under microgravity conditions, we developed AD system under microgravity conditions during parabolic flight by MU-300 airplane. Using the system, we succeeded to make thin films of (Pb(Ti,Zr)O3) (PZT) with very smooth surface morphology by the AD technique under microgravity conditions. We also observed aerosol (He gas and PZT fine powders) dynamics during thin films deposition by flow visualization with light scattering technique. From these observations, we conclude that it is possible to make homogeneous aerosol under microgravity. Therefore, if we perform constant microgravity conditions such as in the international space station (ISS) we will be able to high quality films with very smooth surface morphology and with very high hardness.
Keyword(s)
Aerosol deposition, parabolic flight, fine particles, thin film
PDF
Download

© The Japan Society of Microgravity Applicaiton

この投稿文は次の言語で読めます: Japanese

ページ先頭に戻る